Description
Clonality: Monoclonal
Host: Mouse
Purification: Ammonium Sulfate
Reactivity: All
Prolonged exposure to solar UV radiation may result in harmful acute and chronic effects to the skin (including skin cancers), eye, and immune system. These harmful effects appear to be closely related to UV-induced DNA damage. Indeed, UV-induced DNA damage plays significant roles in cell-cycle arrest, activation of DNA repair, cell killing, mutation, and neoplastic transformation. The major types of DNA damage induced by solar UV radiation are cyclobutane pyrimidine dimers (CPDs), (6–4) photoproducts (6-4PPs), and Dewar valence isomers of 6-4PPs (Dewar photoproducts; DewarPPs) formed between adjacent pyrimidine nucleotides on the same DNA strand. Approximately 70-80% of UV-induced DNA damage is CPDs and the remaining is 6-4PPs and Dewar isomers of 6-4PPs. DewarPPs are produced by the photoisomerization of 6-4PPs by UV radiation around 325 nm. In normal human cells these types of DNA lesions are repaired by nucleotide excision repair (NER).
To better study molecular events surrounding UV-induced DNA damage and repair, Matsunaga et. al. have established and characterized monoclonal antibodies against DewarPPs (9). These antibodies enable quantitation of DNA photoproducts from cultured cells or from skin epidermis using enzyme-linked immunosorbent assay (ELISA). They also permit indirect immunofluorescence (IIF) visualization of DNA photoproducts in skin. This technology will contribute to understanding of molecular mechanisms of cellular responses to UV and DNA damage in many research fields including cancer research, photobiology, dermatology, ophthalmology, immunology, and cosmetology.
REACTIVITY:
1) DewarPPs in single-stranded DNA.
2) DewarPPs formed in TC, TT and CC dipyrimidine sequences.
3) DewarPPs formed in oligonucleotides consisting of more than eight bases.
References:
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9) Matsunaga, T., et al., Photochem. Photobiol. 57, 934-940 (1993).
10) Matsunaga, T., et al., Photochem. Photobiol. 54, 403-410 (1991).
11) Mitchell D.L. Mutat. Res., 194, 227-237 (1988).
